Applying Response Surface Methodology for the Mapping of Exposure Planes

The application of a statistical technique, Response Surface Methodology (RSM) for the mapping of exposure surfaces has been presented. Use of this method allows a systematic means of testing exposure planes for evenness of illumination, and generates a contour map of the illumination at the plane. The work described here was done with negative acting photo-resist type systems (proofing) but would be positive acting or film systems.