High Speed Photopolymer Offset Plate [MUH] For Projection And Laser Exposure

MUH is a high-speed photopolymer offset plate especially designed for non-contact exposure systems. By selecting special combinations of spectral sensitizer and initiator, the absorption wavelength and exposure energy of photopolymer can be independently controlled and three types of MUH are developed. Type 1: for projection exposure Type 1: for projection exposure absorption maximum (435 nm) exposure energy (5 mj/cm2) Type 2: for visible laser exposure absorption maximum (488 nm) exposure energy (1 mj/cm2) Type 3: for UV laser exposure absorption maximum (364 nm) exposure energy (0.3 mj/cm2) By applying maleimide polymer to the binder of the photosensitive layer, all three types of MUH can be developed by aqueous alkaline solution. The shelf life of MUH is the same as conventional diazo offset plates, due to the low-intensity reciprocity-failure mechanism.