Recent Survey of Materials for Lithographic Platemaking.

This paper is a tutorial study of lithographic plate-making. It covers positive and negative diazo coatings; polyvinyl cinnamic acid esters (KPR types) and their many variations; aromatic azides for wipe-on coatings; the mechanism of the NAPP Water Plate; positive working diazo and photopolymer systems; camera speed plate systems like silver halide, electrophotographic, 3M Pyrofax, and KC; plate systems for laser imaging; dry development (peel-off) systems; driographic systems; plate systems using hydrous oxides of metals; and systems using the change in surface chemical properties of photosensitive flourine polymers.