Imagewise Electrolytic Deposition of Copper for Lithography.

Details:

Year: 1958
Pages: 5

Summary:

All practical bimetallic lithographic processes depend upon the etching of metal from unwanted areas. A considerable amount of thought and effort has been expended on the possibility of depositing metal during the processing. A process has been developed that allows the electrolytic deposition of copper as the image metal on stainless steel or aluminum base plates. The results appear to have the benefits of good tone reproduction, wear resistance and the certainty and recoverability generally associated with bimetal lithographic plates.